NEWS

  • What is the difference between precursor ALD and CVD
    2024-08-15

    ALD and CVD are thin film deposition techniques that facilitate the deposition of thin films on substrates. The main difference between the two technologies lies in the way they deposit thin films. The main difference between ALD and CVD is that atomic layer deposition (ALD) deposits a thin film of one atomic layer at a time, while CVD can deposit a wider range of thin films.

  • There are two methods for producing peptides (knowledge)
    2024-08-15

    The production of peptides is generally divided into two methods: chemical synthesis and biosynthesis. Whether it is chemical synthesis or biosynthesis, the production of peptides requires strict control of reaction conditions, purification steps, and quality testing to ensure the purity and quality of peptides.